Triple Glory Products

Products

Categories Title Description
Furnace / LPCVD TEL Indy 1. DPoly Furnace.
2. Vintage:2007
3. Wafer size:12 inch
Furnace / LPCVD TEL Formula 1. DPOLY Furnace.
2. Vintage:2009
3. Wafer size:12 inch
Furnace / LPCVD TEL Formula 1. NIT Furnace.
2. Vintage:2007
3. Wafer size:12 inch
Furnace / LPCVD TEL Alpha303i 1. TEOS Furnace.
2. Vintage:2005
3. Wafer size:12 inch
4. Process : TEOS , Poly , NIT , PIQ , Sinter , Alloy ,Sintering , Anneal
Furnace / LPCVD TEL Alpha303i 1. FTP Anneal Furnace.
2. Vintage:2005.
3. Wafer size:12 inch
4. Process :
FTPS NIT SIN
FTPS Anneal / SOG Anneal
FTPS Alloy
FTPS Poly
FTPS Sinter / Sintering
Etch TEL TE8500P 1. Oxide Etcher.
2. Vintage:1995-07.
3. E Chuck type
Photos DNS SK-200W-AVP 1. Coat and Develop, 2C2D.
2. Vintage:1997.
3. Wafer size:6 inch.
Metrology KLA UV-1280SE 1. 150mm-200mm Wafers.
2. Measures Film Thickness.
3. Refractive Index and Extinction Coefficient.
Metrology KLA / Filmetrics F20 1. The film thickness measurement.
2. Manufacture Time:2021.
3. Working condition.